Paper
30 April 1981 Raman Scattering Detection Of Elemental Group V Deposits In Native Oxides On III-V Compound Semiconductors
G. P. Schwartz
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Abstract
The application of surface reflection Raman scattering as an optical probe for monitor-ing the presence and growth of elemental deposits of group V (P,As,Sb) metalloids in native oxide films on III-V compound semiconductors is discussed. Selective data from the litera-ture concerning arsenic inclusions in native oxides on GaAs and AlxGal_xAs and red phosphor-us deposits in thermally oxidized films on InP are used to illustrate the technique.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. P. Schwartz "Raman Scattering Detection Of Elemental Group V Deposits In Native Oxides On III-V Compound Semiconductors", Proc. SPIE 0276, Optical Characterization Techniques for Semiconductor Technology, (30 April 1981); https://doi.org/10.1117/12.931689
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Cited by 1 scholarly publication.
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KEYWORDS
Arsenic

Oxides

Raman scattering

Crystals

Gallium arsenide

Raman spectroscopy

Phosphorus

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