9 November 1981 Ultraviolet And X-Ray Lithography
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Proceedings Volume 0279, Ultraviolet and Vacuum Ultraviolet Systems; (1981) https://doi.org/10.1117/12.965712
Event: 1981 Technical Symposium East, 1981, Washington, D.C., United States
Abstract
Characteristics of the generation and absorption of ultraviolet radiation and x-rays are examined for their effects on lithographic replication of tine scale features. Direct-write, projection, proximity and contact UV lithography are Drietly reviewed. Emphasis is given to x-ray lithography, especially the wide variety of potentially useful plasma x-ray sources. Reference is also made to other aspects of x-ray lithography, namely masks, resists and alignments, as well as full x-ray exposure systems.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. J. Nagel, D. J. Nagel, } "Ultraviolet And X-Ray Lithography", Proc. SPIE 0279, Ultraviolet and Vacuum Ultraviolet Systems, (9 November 1981); doi: 10.1117/12.965712; https://doi.org/10.1117/12.965712
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