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19 February 1982 Contamination Simulation Facility With In Situ Infrared Analysis Capability
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Proceedings Volume 0287, Shuttle Optical Environment; (1982) https://doi.org/10.1117/12.932014
Event: 1981 Technical Symposium East, 1981, Washington, D.C., United States
Abstract
A new volatile condensable materials (VCM) facility has been constructed. The facility features a unique in situ Fourier transform infrared spectrophotometric system in addition to a quartz crystal microbalance and quadrupole mass spectrometer. Contaminants can be collected and subjected to infrared spectroscopy at the collection temperature, circumventing problems associated with ex situ infrared measurements. Preliminary results indicate that VCM, with deposition thicknesses less than 200 Å, can be identified.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David J. Carre and Paul D. Fleischauer "Contamination Simulation Facility With In Situ Infrared Analysis Capability", Proc. SPIE 0287, Shuttle Optical Environment, (19 February 1982); https://doi.org/10.1117/12.932014
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