High-Precision Multipass Reflectometer

David F. Edwards; Philip Baumeister

doi:10.1117/12.932074

30 December 1981 High-Precision Multipass Reflectometer

David F. Edwards, Philip Baumeister

Proceedings Volume 0288, Los Alamos Conf on Optics '81; (1981) https://doi.org/10.1117/12.932074
Event: Los Alamos Conference on Optics, 1981, Los Alamos, United States

Abstract

The multipass reflectometer has been shown to be a convenient and precise instrument for the measurement of spectral reflectances in excess of 0.99. This report gives a brief sketch of the initial setup of the reflectometer, its operation, optimization of para-meters, and some limitations to the expected precision. The instrumental precision is set by the uncertainty in the computer fit of a straight line to the measured data. Systematic errors due to nonuniform photosurfaces and the effects of astigmatism have been minimized. We have used this reflectrometer to measure the absolute reflectance of evaporated aluminum films in the uv and visible regions. It has also been used to measure the low-level insertion losses of laser window materials for this same spectral region.

Citation Download Citation

David F. Edwards and Philip Baumeister "High-Precision Multipass Reflectometer", Proc. SPIE 0288, Los Alamos Conf on Optics '81, (30 December 1981); https://doi.org/10.1117/12.932074

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