Paper
3 May 1982 Manufacture And Measurement Of Ion-Etched X-Ray Diffraction Gratings
C. A. Wallace, G. D. Ludbrook, M. Stedman
Author Affiliations +
Proceedings Volume 0315, Reflecting Optics for Synchrotron Radiation; (1982) https://doi.org/10.1117/12.933005
Event: 1981 Brookhaven Conferences, 1981, Upton, United States
Abstract
X-ray and EXUV diffraction gratings for synchrotron radiation are made from a ho lographically recorded master by ionetching very shallow groove profiles into the super-smooth surface of a stable silica material. Both rectangular and saw-tooth grating profiles are produced. The gratings are evaluated using optical, contacting stylus and X-ray calibration techniques.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. A. Wallace, G. D. Ludbrook, and M. Stedman "Manufacture And Measurement Of Ion-Etched X-Ray Diffraction Gratings", Proc. SPIE 0315, Reflecting Optics for Synchrotron Radiation, (3 May 1982); https://doi.org/10.1117/12.933005
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Cited by 3 scholarly publications.
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KEYWORDS
Diffraction gratings

X-rays

Synchrotron radiation

Silica

Ions

Manufacturing

Mirrors

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