24 March 1982 Use Of Phase Measuring Interferometry For Surface Characterization
Author Affiliations +
Proceedings Volume 0316, High Resolution Soft X-Ray Optics; (1982) https://doi.org/10.1117/12.933118
Event: 1981 Brookhaven Conferences, 1981, Upton, United States
Abstract
The Phase Measuring Interferometer (PMI) technique has been adapted to the measurement of small scale features of very high quality (low scatter) optical surfaces. The method described has good vertical and lateral resolution over a wide range of fields. It is non-contacting, applicable to various materials and coatings, and can be extended to spherical and aspherical surfaces. The compact PMI device can be modified to provide in-situ measurements on both small and very large optical surfaces. Data, including rms surface roughness and surface contour maps, are presented for several surfaces. The nature and effect of the principal error sources are also discussed.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chungte W. Chen, "Use Of Phase Measuring Interferometry For Surface Characterization", Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); doi: 10.1117/12.933118; https://doi.org/10.1117/12.933118
PROCEEDINGS
7 PAGES


SHARE
Back to Top