24 March 1982 X-Ray And Extreme Ultraviolet Imaging Using Layered Synthetic Microstructures
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Proceedings Volume 0316, High Resolution Soft X-Ray Optics; (1982) https://doi.org/10.1117/12.933135
Event: 1981 Brookhaven Conferences, 1981, Upton, United States
Techniques have recently been developed for the fabrication, by sputtering, of multi-layer structures in which the individual layers may have thicknesses as little as a few atomic diameters. Diffraction experiments with x-rays of wavelength ranging from less than 1 Å to 113 Å have shown these layered synthetic microstructures to have a high degree of perfection. They act as efficient reflectors for x-rays and EUV radiation at angles of incidence from 0o to almost 90o (extreme glancing incidence). Experimental results using normal incidence imaging optics at soft x-ray wavelengths are shown. Such optics can be used in a variety of configurations for both solar and non-solar x-ray astronomy. The advantages of two particular systems - the single mirror and the hybrid Wolter-LSM system - are discussed and performance calculations presented.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James H. Underwood, James H. Underwood, Troy W. Barbee, Troy W. Barbee, David L. Shealy, David L. Shealy, "X-Ray And Extreme Ultraviolet Imaging Using Layered Synthetic Microstructures", Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); doi: 10.1117/12.933135; https://doi.org/10.1117/12.933135

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