Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb2O5, And Ta2O5 Optical Thin Film Waveguides

S. Dutta; H. E. Jackson; J. T. Boyd

doi:10.1117/12.933213

27 August 1982 Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si₃N₄, Nb₂O₅, And Ta₂O₅ Optical Thin Film Waveguides

S. Dutta, H. E. Jackson, J. T. Boyd

Author Affiliations +

Proceedings Volume 0321, Integrated Optics II; (1982) https://doi.org/10.1117/12.933213
Event: 1982 Los Angeles Technical Symposium, 1982, Los Angeles, United States

Abstract

We report consiaerabe success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally-oxidized silicon substrates. For the materials Si 3N4, Nb90,, and Ta205 values of waveguide loss less than 1 oB/cm were achieved. Values of waveguide loss as1UW as'.01 db/cm nave been measured for laser-annealed Zn0 waveguides and for Corning 7059 glass wave-guides which have been both laser anneal ea and had surface coatings applied.

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S. Dutta, H. E. Jackson, and J. T. Boyd "Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si₃N₄, Nb₂O₅, And Ta₂O₅ Optical Thin Film Waveguides", Proc. SPIE 0321, Integrated Optics II, (27 August 1982); https://doi.org/10.1117/12.933213

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