High Speed Direct Write Electron Beam System

Frank Ura; Paul Rissman

doi:10.1117/12.933417

30 June 1982 High Speed Direct Write Electron Beam System

Frank Ura, Paul Rissman

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933417
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

The total sales dollars of semiconductors over the past six years have grown roughly at the rate of 25% per year in spite of the fact that the price of some of the individual components has decreased dramatically. This has resulted in a significant reduction in the cost per function. As this occurs, new markets open up creating additional demands.

Citation Download Citation

Frank Ura and Paul Rissman "High Speed Direct Write Electron Beam System", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933417

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available