On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films

T. Venkatesan; B. Wilkens

doi:10.1117/12.933429

30 June 1982 On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films

T. Venkatesan, B. Wilkens

Author Affiliations +

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933429
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Silver-sensitized obliquely deposited germanium selenide films have been shown to exhibit enhanced lithographic sensitivities. Rutherford backscattering (RBS) measurements of silver diffusion profiles indicate absence of any enhanced silver diffusion in the obliquely deposited films during the exposure process. From dissolution rate measurements and a quantitative measure of the silver left on the film at various stages, we conclude that the enhanced silver uptake in the oblique films during the sensitization process and the specific way the silver coats the columnar structure of the obliquely deposited films cause the sensitivity enhancement.

Citation Download Citation

T. Venkatesan and B. Wilkens "On The Mechanism Of The Lithographic Sensitivity Enhancement Of Obliquely Deposited Germanium Selenide Films", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933429

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