Plasma Sources For X-Ray Lithography

S. M. Matthews; R. S. Cooper

doi:10.1117/12.933425

30 June 1982 Plasma Sources For X-Ray Lithography

S. M. Matthews, R. S. Cooper

Proceedings Volume 0333, Submicron Lithography I; (1982) https://doi.org/10.1117/12.933425
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

The Gas Puff Z-Pinch (GPZP) plasma X-ray source has a number of demonstrated advantages over conventional X-ray sources as applied to high throughput X-ray microlithography. The Physics International Company (PI) is presently constructing a GPZP X-ray source that has been designed for application to the microlithography industry.

Citation Download Citation

S. M. Matthews and R. S. Cooper "Plasma Sources For X-Ray Lithography", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); https://doi.org/10.1117/12.933425

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