30 June 1982 Plasma Sources For X-Ray Lithography
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Abstract
The Gas Puff Z-Pinch (GPZP) plasma X-ray source has a number of demonstrated advantages over conventional X-ray sources as applied to high throughput X-ray microlithography. The Physics International Company (PI) is presently constructing a GPZP X-ray source that has been designed for application to the microlithography industry.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. M. Matthews, S. M. Matthews, R. S. Cooper, R. S. Cooper, } "Plasma Sources For X-Ray Lithography", Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933425; https://doi.org/10.1117/12.933425
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