Paper
13 September 1982 Comparison Of Autoalign Techniques
Bruce Heflinger
Author Affiliations +
Abstract
Design criteria for wafer stepper alignment systems are discussed. Several examples are presented. A glossary of terms is included.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce Heflinger "Comparison Of Autoalign Techniques", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933562
Lens.org Logo
CITATIONS
Cited by 5 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical alignment

Semiconducting wafers

Reticles

Tolerancing

Photoresist materials

Distortion

Optical lithography

RELATED CONTENT

Fractured Alignment Mark Technology For Wafer Steppers
Proceedings of SPIE (August 20 1986)
Mix And Match Of 10 1 Wafer Steppers With Die...
Proceedings of SPIE (September 13 1982)
The Paths To Subhalf-Micrometer Optical Lithography
Proceedings of SPIE (January 01 1988)
0.10-um overlay for DRAM production using step and scan
Proceedings of SPIE (June 01 1990)
Overlay Tolerances For Vlsi Using Wafer Steppers
Proceedings of SPIE (January 01 1988)

Back to Top