Resist Characterization: Procedures, Parameters, And Profiles

M. Exterkamp; W. Wong; H. Damar; A. R. Neureuther; C. H. Ting; W. G. Oldham

doi:10.1117/12.933575

13 September 1982 Resist Characterization: Procedures, Parameters, And Profiles

M. Exterkamp, W. Wong, H. Damar, A. R. Neureuther, C. H. Ting, W. G. Oldham

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933575
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Measurement systems for determining the exposure and development model are coupled with SAMPLE resist profile simulations to explore the impact of positive photoresist types, processing conditions, developer types, and resist lots on line edge profiles. The exposure system uses the optical transmission of a resist layer on a nonreflecting glass substrate as a function of exposure. A full spectrum, high intensity "hard" bleach is used to completely expose the photoactive compound. The companion development system uses optical interference through a transparent substrate to measure the development rate. The reproducibility of these systems and their accuracy compared to independent measurements are considered. These systems are applied to the problems of determining the critical prebake temperature at which thermal degradation occurs, exploring differences between developers, and making lot-to-lot comparisons of resists. Parameter values for several resists are reported. The importance of the exposure and development parameters is illustrated using the SAMPLE program.

Citation Download Citation

M. Exterkamp, W. Wong, H. Damar, A. R. Neureuther, C. H. Ting, and W. G. Oldham "Resist Characterization: Procedures, Parameters, And Profiles", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933575

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available