Reticle Inspection Technology To Compare The Pattern Against Data

Daikichi Awamura

doi:10.1117/12.933578

13 September 1982 Reticle Inspection Technology To Compare The Pattern Against Data

Daikichi Awamura

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933578
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

This presentation describes a newly developed and very innovative reticle inspection system, the purpose of which is to make a comparison between the reticle pattern and the data base stored on the Mag Tape. Also, this paper will include the operational report from a couple of semi-conductor companies where the systems are already installed and are operating very successfully. To verify the reticle pattern as compared with the data base is becomming extremely important for the subsequent process; especially in the upcomming Direct Step on the Wafer era. The system consists of three parts: X-Y stage unit, Control unit, and Video conversion unit. With respect to the inspection principle, the actual reticle pattern is converted into a Video signal by utilizing the combination of the mercury lamp and a 1024 bits linear photo diode array. This signal is shown on the monitor #1 of the Control unit. The data stored on the PG tape is converted into its own data format which is fed into the Video conversion unit for the conversion into a video signal and then displayed on the monitor #2 of the Control unit. The system processes and compares the two video signals electronically, and any descrepancy between two images is identified as the defect and displayed on the monitor #3. The defect detectability is approx. 2 to 3 microns at present and it requires approx. 5 to 6 min. to inspect a 50 mm2 pattern. The system is capable of providing all the necessary information regarding the detected defects, such as its Location and kind to the plotter, repair system (Zapper) and other peripherals by either On-line or Off-line methods. One of the key features of this system is that all the defects detected electronically can be reviewed and confirmed by the human eye. The use of this system is expected to result in a higher device yield.

Citation Download Citation

Daikichi Awamura "Reticle Inspection Technology To Compare The Pattern Against Data", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933578

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