13 September 1982 Spectral Exposure Meter
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Abstract
As microlithography progresses to smaller geometries, the tolerance available for exposure variation is rapidly diminishing. Due to this requirement, it is advantageous to set the exposure more accurately by using an exposure meter that has its spectral response matched to the photoresist spectral response. A new exposure meter has been developed that contains a complete UV spectrometer in a package the size of a 100mm wafer chuck. This meter can be adjusted to match the response of any photoresist over the wavelength range of 254 to 436 nanometers.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nathan Gold, Nathan Gold, } "Spectral Exposure Meter", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933557; https://doi.org/10.1117/12.933557
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