13 September 1982 Ultrafast High Resolution Contact Lithography Using Excimer Lasers
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A new technique for fine-line, high-speed photolithography using ultraviolet excimer lasers is proposed and demonstrated. Absence of speckle and resolution down to 1000 line-pairs/mm are experimentally demonstrated. Using a XeCl laser at 308 nm and a KrF laser at 249 nm, excellent quality images are obtained by contact printing in two positive photoresists. These images are comparable to state-of-the-art lithography done with conventional lamps, the major difference being that the excimer laser technique is -2 orders of magnitude faster. Preliminary results on reciprocity behavior in several resists are also presented.
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K. Jain, C. G. Willson, B. J. Lin, "Ultrafast High Resolution Contact Lithography Using Excimer Lasers", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933585; https://doi.org/10.1117/12.933585


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