Paper
28 December 1982 Pattern Nonuniformities Of Imaging Charge Injection Device Arrays Due To Distributed Resistance Capacitance Effects
C.H. Chen, D. N. Pocock
Author Affiliations +
Proceedings Volume 0341, Real-Time Signal Processing V; (1982) https://doi.org/10.1117/12.933716
Event: 1982 Technical Symposium East, 1982, Arlington, United States
Abstract
A potential source of response nonuniformities of imaging CID's is attributed to the transient behavior of the distributed resistance capacitance (DRC) network associated with the row and column electrodes. The DRC network is evidenced and characterized by the measurement of frequency-dependent admittance. Simulated response nonuniformities are compared favorably to experimentally observed patterns of an InSb CID array. The characteristics and their imposed limitations on the array size, pixel density, and readout rate are discussed.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C.H. Chen and D. N. Pocock "Pattern Nonuniformities Of Imaging Charge Injection Device Arrays Due To Distributed Resistance Capacitance Effects", Proc. SPIE 0341, Real-Time Signal Processing V, (28 December 1982); https://doi.org/10.1117/12.933716
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KEYWORDS
Electrodes

Capacitance

Signal processing

Resistance

Imaging devices

Chromium

Medium wave

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