Comparison Of Optical And Mechanical Methods Of Thickness Measurement

Albert Feldman; Theodore Vorburger

doi:10.1117/12.933685

15 October 1982 Comparison Of Optical And Mechanical Methods Of Thickness Measurement

Albert Feldman, Theodore Vorburger

Proceedings Volume 0342, Integrated Circuit Metrology I; (1982) https://doi.org/10.1117/12.933685
Event: 1982 Technical Symposium East, 1982, Arlington, United States

Abstract

A variety of techniques is used for the measurement of thin film thicknesses of the order of one micrometer. These techniques include stylus profilometry, multiple beam interferometry, dual beam interferometry, guided waves, channel spectra and ellipsometry. The principles underlying each of the techniques are discussed and where available, experimental comparisons of the techniques are presented. Advantages, disadvantages, and sources of error are also discussed.

Citation Download Citation

Albert Feldman and Theodore Vorburger "Comparison Of Optical And Mechanical Methods Of Thickness Measurement", Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); https://doi.org/10.1117/12.933685

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