Defect And Measurement Evaluation System

James F. Cosgrove

doi:10.1117/12.934115

23 May 1983 Defect And Measurement Evaluation System

James F. Cosgrove

Proceedings Volume 0360, Robotics and Industrial Inspection; (1983) https://doi.org/10.1117/12.934115
Event: 26th Annual Technical Symposium, 1982, San Diego, United States

Abstract

The defect and measurement evaluation system represents a successful computer-microscope partnership that has enhanced the visual inspection of LSI wafers during the manufacturing process. Fabrication and process control of small geometry, semiconductor devices demand high quality visual inspection systems and real-time analysis of pattern width measurements, defects and surface characteristics. The defect and measurement evaluation system tool has coupled a high quality, wide-field microscope system to an IBM 5100 computer. This provides an integrated tool controller, real-time data collection and analysis system. With the inspector in mind, the design and packaging of the tool was human-factor-engineered for ease of operation and minimum fatigue.

Citation Download Citation

James F. Cosgrove "Defect And Measurement Evaluation System", Proc. SPIE 0360, Robotics and Industrial Inspection, (23 May 1983); https://doi.org/10.1117/12.934115

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