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8 November 1983 Vacuum Methods For Layer Deposition And Application To Device Structures
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Proceedings Volume 0387, Technology of Stratified Media; (1983) https://doi.org/10.1117/12.934985
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States
Abstract
This paper reviews the deposition methode of single element metallic films, refractory films, silicides, vacuum epitaxy of metallic films, silicon and GaAs. The vacuum deposition techniques are: rf sputtering, magnetron sputtering, e-beam deposition, vacuum epitaxy and molecular beam epitaxy. Finally, the application of these films to microwave devices and integrated circuits is reviewed.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aristos Christou "Vacuum Methods For Layer Deposition And Application To Device Structures", Proc. SPIE 0387, Technology of Stratified Media, (8 November 1983); https://doi.org/10.1117/12.934985
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