7 November 1983 Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography.
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Abstract
The influence of two kinds of electro-attractive substituents on acrylic type positive resists upon the sensitivity on electrons or soft x-rays (λ = 13.34 Å) was studied. - Fluorine atoms were incorporated into the poly(alkylmethacrylate) ester chain. - Cyano group was substituted to methyl group bonded to the polymethacrylate quaternary carbon atom. The results were interpreted on the basis of the modified relationships of KU and SCALA, SPEARS and SMITH, giving the incident dose for an electron beam and x-ray irradiation respectively.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Serre, B. Serre, F. Schue, F. Schue, A. Eranian, A. Eranian, E. Datamanti, E. Datamanti, J. c. Dubois, J. c. Dubois, C. Montginoul, C. Montginoul, L. Giral, L. Giral, } "Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography.", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935112; https://doi.org/10.1117/12.935112
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