7 November 1983 Scanning Ion Beam Lithography For Sub-Micron Structure Fabrication
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Abstract
A scanning ion beam lithography instrument for the fabrication of sub-micron structures has been constructed and evaluated. It employs a tetrode gun, which accelerates the ions to the full beam voltage, and an einzel lens objective. Both gallium and gold-silicon liquid-metal sources have been used for resist exposure, and gallium sources have been used for direct selective ion implantation and for micromachining.
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J. R. A. Cleaver, J. R. A. Cleaver, P. J. Heard, P. J. Heard, H. Ahmed, H. Ahmed, } "Scanning Ion Beam Lithography For Sub-Micron Structure Fabrication", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935104; https://doi.org/10.1117/12.935104
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