7 November 1983 Solid State Electron Beam Chemistry
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Abstract
A brief account is presented on an approach for a quantitative understanding of solid state electron beam chemistry that is directed towards understanding the radiation sensitivity of electron beam resists. Results obtained by irradiating PVA with and without additives, using a 25 kV electron beam, are shown in order to investigate the possible spherical and chemical mechanisms induced by the electron beam.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Pacansky, "Solid State Electron Beam Chemistry", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935089; https://doi.org/10.1117/12.935089
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