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7 November 1983 Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist Scheme
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Abstract
This paper describes the application of the tri-level resist system for both optical and electron beam lithographies, in order to improve the resolution.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F Buiguez, P. Parrens, and B. Picard "Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist Scheme", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935110
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