Waferwriter: A Process-Compatible Electron Beam Direct Write System

W. R. Livesay; J. S. Greeneich; J. E. Wolfe; R. J. Felker

doi:10.1117/12.935094

7 November 1983 Waferwriter: A Process-Compatible Electron Beam Direct Write System

W. R. Livesay, J. S. Greeneich, J. E. Wolfe, R. J. Felker

Proceedings Volume 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II; (1983) https://doi.org/10.1117/12.935094
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

A high current gaussian E-beam system is described which exhibits superior throughput and pattern dimensional control compared to reported shaped beam systems in the resolution ranges where direct writing is economically feasible. The Waferwriter' system is an ultra-high current density multiple gaussian beam system capable of exposing popular photoresists at higher rates than any reported shaped beam system in the 0.5 to 2μm feature size range. In addition, greater pattern line width control can be achieved than with shaped beam systems due to sharper beam edge gradients. Alignment and overlay are also improved due to the higher signal-to-noise ratio obtained with the brighter electron beam source.

Citation Download Citation

W. R. Livesay, J. S. Greeneich, J. E. Wolfe, and R. J. Felker "Waferwriter: A Process-Compatible Electron Beam Direct Write System", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); https://doi.org/10.1117/12.935094

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