7 November 1983 X-Ray Lithography Exposures Using Synchrotron Radiation
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Abstract
A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in operation at Brookhaven National Laboratory. The characteristics of synchrotron radiation and the reasons for using such a source are discussed. A description of the beamline and its control system is given, and results of early exposures are presented.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerome P. Silverman, Jerome P. Silverman, Rolf P. Haelbich, Rolf P. Haelbich, Warren D. Grobman, Warren D. Grobman, John M. Warlaumont, John M. Warlaumont, } "X-Ray Lithography Exposures Using Synchrotron Radiation", Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935100; https://doi.org/10.1117/12.935100
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