7 November 1983 "Chemical Safety In The 1980s"
Author Affiliations +
Abstract
In this presentation, I'd like to share my perspective on chemistry and, specifically, on chemical safety in the '80s. That perspective, incidentally, will come from my experience managing one of the world's largest industrial health laboratories. I will make some observations about chemical safety in the '80s as they pertain to the photographic industry and, of course, to other industries that utilize photographic technologies and processes.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert L. Raleigh, ""Chemical Safety In The 1980s"", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935117; https://doi.org/10.1117/12.935117
PROCEEDINGS
26 PAGES


SHARE
RELATED CONTENT

Sampling considerations for semiconductor manufacture
Proceedings of SPIE (July 01 1994)
Design and modeling of XYθ H type stage using 1...
Proceedings of SPIE (October 28 2011)
Monte Carlo model of charging in resists in e beam...
Proceedings of SPIE (August 22 2001)
Environmental Aspects Of Tellurium Based Alloys In Optical...
Proceedings of SPIE (November 10 1983)
Agility enabled by the SEMATECH CIM framework
Proceedings of SPIE (January 21 1997)
Monte Carlo model of charging in resists in e beam...
Proceedings of SPIE (June 02 2000)

Back to Top