7 November 1983 New Positive Resist Designed For Use In The Mid Ultraviolet
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Waycoat WX-159 is a positive resist designed for use with optical aligners operating in the mid-UV (280-320 nm). Spectral data is presented indicating potential applications of WX-159 resist in the deep UV (220-280 nm) and near UV (330-400 nm) as well. Data are presented demonstrating the use of WX-159 in conventional UV as well as the mid-UV regime. The resist with both metal containing and metal ion free developers is characterized by two techniques: 1) contrast curve of remaining film thickness after development versus exposure energy, and 2) dissolution rate monitor comparison of exposed and unexposed WX-159 films. The impact of developer composition on resist profile is shown wherein WX-402 developer produces near vertical, flat topped, micron size WX-159 images.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. F. Leonard, R. F. Leonard, W. F. Cordes, W. F. Cordes, } "New Positive Resist Designed For Use In The Mid Ultraviolet", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935130; https://doi.org/10.1117/12.935130

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