7 November 1983 Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid
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Abstract
This paper describes the comparison of registration accuracies at device fabrication level, and the analysis of their registration errors, in 1/10 steppers(GCA 4800 DSW), 1/1 scanning projection aligns (Perkin-Elmer 140), and their hybrid. The registration accuracy (6R) was evaluated by fabricating an n-MOS test device of double poly-Si structure at 50 - 54 dies a 4"0 wafer. For the analysis of registration errors, five independent factors such as alignment error (6A), machine stability-and-compatibility error (6D), mask error (6M), mask thermal expansion error (6T), and residual error(6r), which are responsible for registration error, were quantitatively measured, including their long period variation.
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S. Uoya, S. Uoya, W. Wakamiya, W. Wakamiya, H. Abe, H. Abe, H. Nakata, H. Nakata, } "Registration Analysis Of 1/10 Steppers, 1/1 Orojections And Their Hybrid", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935125; https://doi.org/10.1117/12.935125
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