A Model For Polychromatic Photoresist Exposure In Optical Microlithography

Giovanni Crosta

doi:10.1117/12.935517

28 November 1983 A Model For Polychromatic Photoresist Exposure In Optical Microlithography

Giovanni Crosta

Author Affiliations +

Proceedings Volume 0401, Thin Film Technologies I; (1983) https://doi.org/10.1117/12.935517
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

Computer codes which simulate the photolithographic process are open loop problem solvers: given the inputs and parameters , a result is predicted . We suggest herewith that control theory may help in closing the feedback loop and allow process design and optimisation. As an example we deal with polychromatic exposure, which aims at reducing the standing wave effect. We consider resist activator dynamics and scalar field equation. A minimisation problem is defined , to which we apply complex Lagrangian theory. Optimal inputs can be searched for by an algorithm of which we give the flow chart.

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Giovanni Crosta "A Model For Polychromatic Photoresist Exposure In Optical Microlithography", Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); https://doi.org/10.1117/12.935517

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