8 September 1983 Cost Estimates For Amorphous Silicon Deposition Processes
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Proceedings Volume 0407, Photovoltaics for Solar Energy Applications II; (1983); doi: 10.1117/12.935689
Event: 1983 Technical Symposium East, 1983, Arlington, United States
Abstract
The throughput and production costs associated with commercial-scale deposition of amorphous silcon solar-cell active layers have been examined. A methodology was developed to isolate and compare the economics of glow discharge deposition, sputter deposition, and conventional and low pressure chemical vapor deposition on a self-consistent basis. The imposition of restrictive assumptions was avoided by leaving key parameters as variables. We conclude that the largest cost differences between deposition processes are most likely to occur in the categories of equipment capital cost and silicon feedstock costs.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. R. Shanfield, R. Wolfson, "Cost Estimates For Amorphous Silicon Deposition Processes", Proc. SPIE 0407, Photovoltaics for Solar Energy Applications II, (8 September 1983); doi: 10.1117/12.935689; https://doi.org/10.1117/12.935689
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KEYWORDS
Silicon

Deposition processes

Sputter deposition

Manufacturing

Chemical vapor deposition

Low pressure chemical vapor deposition

Amorphous silicon

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