19 October 1983 Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy
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This paper describes a new technique, Sputter-Initiated Resonance Ionization Spectroscopy (SIRIS)t, for ultrasensitive elemental analysis of solid samples. SIRIS combines resonance ionization spectroscopy and ion beam sputtering to provide analyses for all the elements except helium and neon with predicted sensitivities down to 1 part in 1012 in routine analysis, and greater for special uses. Basic concepts of this technology and new results in the development of the new SIRIS process and apparatus are presented.
© (1983) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. E. Parks, H. W. Schmitt, G. S. Hurst, W. M. Fairbank, "Ultrasensitive Elemental Analysis Of Solids By Sputter Initiated Resonance Ionization Spectroscopy", Proc. SPIE 0426, Laser-Based Ultrasensitive Spectroscopy and Detection V, (19 October 1983); doi: 10.1117/12.936233; https://doi.org/10.1117/12.936233


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