9 January 1984 Pattern Inspection Techniques for SEM Image
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Abstract
We have developed pattern inspection techniques for Integrated Circuit elements which use an SEMI (Scanning Electron Microscope). In this paper we will discuss the transformation of low SP1 ratio SEM image signals into binary values, detection techniques using the SEM to detect patterns on insulating materials, and detection algorithms for defects.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Toshimitsu Hamada, Asahiro Kuni, Kazushi Yoshimura, and Hiroshi Makihira "Pattern Inspection Techniques for SEM Image", Proc. SPIE 0432, Applications of Digital Image Processing VI, (9 January 1984); doi: 10.1117/12.936682; https://doi.org/10.1117/12.936682
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