Pattern Inspection Techniques for SEM Image

Toshimitsu Hamada; Asahiro Kuni; Kazushi Yoshimura; Hiroshi Makihira

doi:10.1117/12.936682

9 January 1984 Pattern Inspection Techniques for SEM Image

Toshimitsu Hamada, Asahiro Kuni, Kazushi Yoshimura, Hiroshi Makihira

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Proceedings Volume 0432, Applications of Digital Image Processing VI; (1984) https://doi.org/10.1117/12.936682
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

We have developed pattern inspection techniques for Integrated Circuit elements which use an SEMI (Scanning Electron Microscope). In this paper we will discuss the transformation of low SP1 ratio SEM image signals into binary values, detection techniques using the SEM to detect patterns on insulating materials, and detection algorithms for defects.

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Toshimitsu Hamada, Asahiro Kuni, Kazushi Yoshimura, and Hiroshi Makihira "Pattern Inspection Techniques for SEM Image", Proc. SPIE 0432, Applications of Digital Image Processing VI, (9 January 1984); doi: 10.1117/12.936682; https://doi.org/10.1117/12.936682

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