Use Of E-Beam Written CGH In Optical Pattern Recognition

R. A. Athale; C. L. Giles; J. A. Blodgett

doi:10.1117/12.937129

26 October 1983 Use Of E-Beam Written CGH In Optical Pattern Recognition

R. A. Athale, C. L. Giles, J. A. Blodgett

Proceedings Volume 0437, Intl Conf on Computer-Generated Holography; (1983) https://doi.org/10.1117/12.937129
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

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R. A. Athale, C. L. Giles, and J. A. Blodgett "Use Of E-Beam Written CGH In Optical Pattern Recognition", Proc. SPIE 0437, Intl Conf on Computer-Generated Holography, (26 October 1983); https://doi.org/10.1117/12.937129

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