27 March 1984 Electron Beam Fabrication And Characterization Of Fresnel Zone Plates For Soft X-Ray Microscopy
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Proceedings Volume 0447, Science with Soft X-Rays; (1984) https://doi.org/10.1117/12.939200
Event: 1983 Brookhaven Conference: Science with Soft X-Rays, 1983, Upton, United States
Abstract
A high resolution Vector Scan electron beam lithography system for fabrication of structures with minimum dimensions below 100 nm is described. A selection was made from a variety of processes suitable for high resolution fabrication, in order to provide the desired properties of apodized Fresnel zone plates used in the Stony Brook X-ray scanning microscope. Experimental characterization of the zone plates with regard to resolution and efficiency in the microscope is described.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D Kern, D Kern, P Coane, P Coane, R Acosta, R Acosta, T.H. P. Chang, T.H. P. Chang, R Feder, R Feder, P Houzego, P Houzego, W Molzen, W Molzen, J Powers, J Powers, A Speth, A Speth, R Viswanathan, R Viswanathan, } "Electron Beam Fabrication And Characterization Of Fresnel Zone Plates For Soft X-Ray Microscopy", Proc. SPIE 0447, Science with Soft X-Rays, (27 March 1984); doi: 10.1117/12.939200; https://doi.org/10.1117/12.939200
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