19 March 1984 B-Si masks for storage ring X-ray lithography
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Abstract
The fabrication of masks used in storage ring X-ray lithography is described. These masks consist of a gold absorber electroplated over a substrate formed by a thin boron-doped silicon membrane covered by a layer of polyimide. Measurement of the properties of the materials which are of concern in this application is also described.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. E. Acosta, J R Maldonado, L K. Towart, and J M Warlaumont "B-Si masks for storage ring X-ray lithography", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939214; https://doi.org/10.1117/12.939214
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