19 March 1984 Synchrotron Radiation X-Ray Lithography: Recent Results
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Abstract
A beamline for making X-ray lithography exposures using synchrotron radiation has been built and is now in routine operation at Brookhaven National Laboratory. The beamline, its optics, and its control system are described, and results are presented showing the intensity and uniformity of the radiation at the wafer. Results of exposures in a variety of resists are shown and discussed.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerome P. Silverman, Rolf P Haelbich, and John M Warlaumont "Synchrotron Radiation X-Ray Lithography: Recent Results", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); doi: 10.1117/12.939206; https://doi.org/10.1117/12.939206
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