X-Ray Lithography Station At The Stanford Synchrotron Radiation Laboratory (SSRL)

P Pianetta; R Tatchyn; R Jaeger; T W Barbee Jr.

doi:10.1117/12.939207

19 March 1984 X-Ray Lithography Station At The Stanford Synchrotron Radiation Laboratory (SSRL)

P Pianetta, R Tatchyn, R Jaeger, T W Barbee Jr.

Proceedings Volume 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology; (1984) https://doi.org/10.1117/12.939207
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

An in-vacuum lithography system is under development on beam line 111-3 at the Stanford Synchrotron Radiation Laboratory (SSRL). The beam line accepts 0.6 mrad of radiation from a bending magnet of the SPEAR storage ring and provides a beam of about 2 X 8 mm2 at the exposure station. Facilities for exposing photoresist with either filtered or monochromatic radiation are being developed in an effort to characterize the spectral sensitivity of state of the art photoresists. Design details and initial results are presented in which submicron features were printed on silicon wafers using boron nitride supported gold ab-sorber masks.

Citation Download Citation

P Pianetta, R Tatchyn, R Jaeger, and T W Barbee Jr. "X-Ray Lithography Station At The Stanford Synchrotron Radiation Laboratory (SSRL)", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); https://doi.org/10.1117/12.939207

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