X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources

A R. Neureuther; K J Kim; A C Thompson; E Hoyer

doi:10.1117/12.939208

19 March 1984 X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources

A R. Neureuther, K J Kim, A C Thompson, E Hoyer

Proceedings Volume 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology; (1984) https://doi.org/10.1117/12.939208
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

Wiggler and undulator insertion devices are very powerful sources which allow new approaches in the design of synchrotron x-ray lithogra-phy systems. The principal advantage of insertion devices is that they can be used as narrow bandwidth high throughput lithography sources at any wavelength. For a wiggler the increased flux can be continuously traded off against beam current, horizontal beam angle and bandwidth. The undulator offers several watts of power in a narrow 1% bandwidth and has a very compact beam (0.05 mr) which must be scanned both horizontally and vertically. Insertion" devices could thus be used in an evolutionary way with conventional x-ray tube technologies or in a revo-lutionary way at high contrast very soft x-ray wavelengths. A systems design approach is used to identify feasible options for wiggler and undulator beam lines for x-ray lithography in the 0.5-0.2 11,μm linewidth region over 5 cm by 5 cm fields. Typical parameters from the Wiggler and Undulator in the Advanced Light Source designed at the Lawrence Berkeley Laboratory are used as examples. Moving from the conventional wavelengths of 4-9 A to very soft wavelengths around 15 A is shown to be very promising. The mask absorber thickness can be reduced a factor of three so that 0.2 Am features can be made with a 1:1 mask aspect ratio. The mask heating rnited exposure time is also reduced a factor of three to 3 sec/cm . However, extremely thin beam line windows (1/4 mil Be) and mask supports (1 Am Si) must be used. A wiggler beam line design using a small slit window at a scanning mirror appears feasible. A unconventional, windowless differentially pumped beam line with dual deflecting mirrors could be used with an undulator source.

Citation Download Citation

A R. Neureuther, K J Kim, A C Thompson, and E Hoyer "X-Ray Lithography Using Wiggler And Undulator Synchrotron Radiation Sources", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); https://doi.org/10.1117/12.939208

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KEYWORDS

Mirrors

Photomasks

Lithography

Silicon

Beryllium

Absorption

Magnesium

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