10 May 1984 Rutherford Scattering-Channeling Analysis Of Semiconductor Structures
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Abstract
The main concepts in ion scattering analysis of interfaces are reviewed and relevant literature is cited. High energy ion scattering has played an important role in the evolving understanding of semiconductor interfaces. A number of extensive reviews describe the fundamentals of this technique and its application to the study of semiconductor interfaces. The main purpose of this paper is to provide the reader with a guide to the existing literature on the subject. This brief review has been published in a similar form for the Materials Research Society Symposium on Interfaces and Contacts, 1982.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. C. Feldman, "Rutherford Scattering-Channeling Analysis Of Semiconductor Structures", Proc. SPIE 0452, Spectroscopic Characterization Techniques for Semiconductor Technology I, (10 May 1984); doi: 10.1117/12.939305; https://doi.org/10.1117/12.939305
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