Translator Disclaimer
14 June 1984 Laser-Assisted Dry Etching Of Semiconducting Materials
Author Affiliations +
Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939447
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States
Abstract
The use of laser assisted chemistry for dry etching of semiconductors is described. Both direct laser-driven etching of GaAs and laser-enhanced plasma etching of Si are given as examples.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P Brewer, W Holber, G Reksten, and R M Osgood Jr. "Laser-Assisted Dry Etching Of Semiconducting Materials", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939447
PROCEEDINGS
4 PAGES


SHARE
Advertisement
Advertisement
Back to Top