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14 June 1984 Optical And Thermal Effects In Laser Chemical Vapor Deposition
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Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939433
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States
Abstract
In laser chemical vapor deposition (LCVD), a laser is used to drive a deposition reaction by locally heating the substrate. Although the reactant systems used may be similar to conventional CVD, the film growth characteristics may differ in several ways. The changes in the optical properties of the film/substrate during deposition must be considered as the amount of laser energy absorbed determines the surface temperature and therefore the deposition rate. Also affecting the deposition rate is the diffusion of reactants to the reaction zone. Because of the small area heated in LCVD, higher surface temperatures can be accessed before diffusion and convection limit the deposition rate. For favorable reactant systems, very rapid deposition rates (greater than 100 um/sec) and scan speeds for line deposition (greater than 10 cm/sec) can be achieved.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S D Allen, R Y. Jan, R. H Edwards, S M Mazuk, and S D Vernon "Optical And Thermal Effects In Laser Chemical Vapor Deposition", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); https://doi.org/10.1117/12.939433
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