The kinetics of processes for laser-photochemically depositing localized thin films are discussed, both in the low-intensity regime, where photoreactions are rate limiting, and in the high-intensity regime, where mass transport is rate limiting. Comparisons are made between processes relying on gas-phase and surface-phase photochemistry. Examples are given of recent studies of photoreactions confined entirely to surface phases, and preliminary results of experiments performed in the mass-transport-limited regime are reported.
J Y Tsao,
D J Ehrlich,
"Surface And Gas Processes In Photodeposition In Small Zones", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); doi: 10.1117/12.939427; https://doi.org/10.1117/12.939427