14 June 1984 Wafer-Scale Laser Pantography: VI. Direct-Write Interconnection Of VLSI Gate Arrays
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Proceedings Volume 0459, Laser-Assisted Deposition, Etching, and Doping; (1984) https://doi.org/10.1117/12.939434
Event: 1984 Los Angeles Technical Symposium, 1984, Los Angeles, United States
General principles of laser direct-write deposition processes are reviewed. Device interconnection of CMOS gate arrays by means of computer-controlled, laser-induced thermochemical surface reactions is described. Interconnection quality parameters are related, and processing rate considerations are discussed.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruce M McWilliams, Bruce M McWilliams, Hon Wah Chin, Hon Wah Chin, Irving P Herman, Irving P Herman, Roderick A. Hyde, Roderick A. Hyde, Fred Mitlitsky, Fred Mitlitsky, John C. Whitehead, John C. Whitehead, Lowell L. Wood, Lowell L. Wood, "Wafer-Scale Laser Pantography: VI. Direct-Write Interconnection Of VLSI Gate Arrays", Proc. SPIE 0459, Laser-Assisted Deposition, Etching, and Doping, (14 June 1984); doi: 10.1117/12.939434; https://doi.org/10.1117/12.939434


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