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21 May 1984 A New Negative/High Resolution Photoresist WX-305
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Abstract
This resist was designed to provide images of high resolution quality and adequate sensitivity to mid/near ultraviolet radiation 310-400nm. This resist is a non-swelling aqueous developable resist with superior resolution to conventional cyclized rubber resist systems. Resolution in the 1 micron region can be obtained in contact and projection exposures with WX-305.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Medhat A. Toukhy and Stephen F. Marcotte Jr. "A New Negative/High Resolution Photoresist WX-305", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); https://doi.org/10.1117/12.941781
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