Polysilanes are a class of Si-Si backbone polymers that have been demonstrated to function as high resolution positive resists with excellent uv sensitivity. These materials have a unique photochemistry with high quantum yields and nonlinear bleaching. Polysilanes serve as excellent RIE barriers for bilevel resist applications because a protective layer of SiO2 is formed during exposure to an oxygen plasma. Aliphatic polysilanes have been applied to full wafer mid-uv lithography with 0.75 μm resolution.
Donald C. Hofer,
Robert D. Miller,
"Polysilane Bilayer uv Lithography", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); doi: 10.1117/12.941772; https://doi.org/10.1117/12.941772