21 May 1984 Polysilane Bilayer uv Lithography
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Abstract
Polysilanes are a class of Si-Si backbone polymers that have been demonstrated to function as high resolution positive resists with excellent uv sensitivity. These materials have a unique photochemistry with high quantum yields and nonlinear bleaching. Polysilanes serve as excellent RIE barriers for bilevel resist applications because a protective layer of SiO2 is formed during exposure to an oxygen plasma. Aliphatic polysilanes have been applied to full wafer mid-uv lithography with 0.75 μm resolution.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald C. Hofer, Donald C. Hofer, Robert D. Miller, Robert D. Miller, C.Grant Willson, C.Grant Willson, } "Polysilane Bilayer uv Lithography", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); doi: 10.1117/12.941772; https://doi.org/10.1117/12.941772
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