Three Dimensional Microfabrication On Thick Film Photoresist Mandrels

William Salmre

doi:10.1117/12.941780

21 May 1984 Three Dimensional Microfabrication On Thick Film Photoresist Mandrels

William Salmre

Proceedings Volume 0469, Advances in Resist Technology I; (1984) https://doi.org/10.1117/12.941780
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Small, three-dimensional structures are fabricated by the use of thick film photoresist mandrels as substrates for electoforming or other deposition techniques. Novel methods have been developed for the sculpting of the resist to desired shapes. These techniques rely heavily on the use of glass or other substrates coated with layers of metal. The metal serves both as a photomask and as a conductor of electricity. Commercially available chrome-on-glass photomasks are convenient for this purpose although other substrates have also been used. By controlling the thickness and light transmission of the metal layer, the amount of exposure of the resist can also be controlled to produce the desired shapes in the resist. For even more complex mandrels the resist can be exposed from both sides using self-aligned photomasks.

Citation Download Citation

William Salmre "Three Dimensional Microfabrication On Thick Film Photoresist Mandrels", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); https://doi.org/10.1117/12.941780

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