Automatic Inspection Of Contaminants On Reticles

Masataka Shiba; Mitsuyoshi Koizumi; Teiji Katsuta

doi:10.1117/12.941922

29 June 1984 Automatic Inspection Of Contaminants On Reticles

Masataka Shiba, Mitsuyoshi Koizumi, Teiji Katsuta

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941922
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Wafer steppers require contaminant-free reticles to assure high yield. This paper describes a new particle detection technique. A linearly polarized He-Ne laser beam scans obliquely across the reticle surface and only scattering light produced by the particles is detected by the detectors, which consist of analyzers, collection lenses, slits, and PMTs (photomultipliers). On the other hand, scattering light produced by the pattern edges on the reticle is cut off by the analyzers. Using this technique, particles as small as 2 1im on the surface of pellicle-installed reticles can be detected.

Citation Download Citation

Masataka Shiba, Mitsuyoshi Koizumi, and Teiji Katsuta "Automatic Inspection Of Contaminants On Reticles", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941922

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