29 June 1984 Cad As The Foundation For Quality Assurance In VLSI Fabrication
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Fabrication of VLSI devices with complex designs and one micron geometries presents a major challenge in the area of quality assurance. The original CAD design can be used as the reference for inspection, if a mechanism is provided for compensating for the effects of the process on the design. Using this approach, Contrex has developed a system for wafer inspection that accurately predicts the shape of a pattern in photoresist, and is able to detect defects as small as 0.3 microns.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raul Brauner, David Pollock, David Bedrosian, "Cad As The Foundation For Quality Assurance In VLSI Fabrication", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); doi: 10.1117/12.941924; https://doi.org/10.1117/12.941924


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